典型文献
Non-alkyl tin-oxo clusters as new-type patterning materials for nanolithography
文献摘要：
Nanolithography plays crucial roles in the miniaturization of dense integrated circuit,which extremely depends on innovative resist materials.Recently,metal-containing resists have been explored due to their higher short-wavelength photon absorption than traditional polymer resists.Herein,for the first time,the patterning performance of non-alkyl tin-oxo clusters has been evaluated.Meanwhile,the influence of structural characteristics on resolution and sensitivity has been investigated.To evaluate the surface ligand effect,three non-alkyl Sn10-oxo clusters with the same core were functionalized with pyrazole,3-methyl-pyrazole and 4-methylpyrazole,respectively.Furthermore,another Sn14-oXo cluster with similar core configuration was also prepared using 4-methylpyrazole ligand to study the influence of Sn nuclearity.Spin-coating method was then applied to fabricate thin films of these non-alkyl tin-oxo clusters on Si substrate,which showed various thicknesses and roughnesses.More interestingly,electron beam lithography (EBL) patterning studies indicated that for the same Sn10 core,the 4-methylpyrazole-decorated clusters showed the best performance.As for the different cluster cores with the same 4-methylpyrazole ligand,the patterns of Sn1o with the higher ligand:Sn ratio are also better than those of Sn14.Finally,distinguishable 50 nm resolution was achieved by 4-methylpyrazole-decorated Sn10 at expose energy of 100 μC/cm2 which can be significantly improved by in-creasing expose energy to 1,000 μC/cm2 as confirmed by atomic force microscopy (AFM) images.This work not only opens the nanolithography applications of non-alkyl tin-oxo clusters,but also provides an effective structural methodology for improving their patterning performance in future.
文献关键词：
中图分类号：
作者姓名：
Di Wang;Xiaofeng Yi;Lei Zhang
作者机构：
State Key Laboratory of Structural Chemistry,Fujian Institute of Research on the Structure of Matter,Chinese Academy of Sciences,Fuzhou 350002,China;University of Chinese Academy of Sciences,Beijing 100049,China
文献出处：
引用格式：
[1]Di Wang;Xiaofeng Yi;Lei Zhang-.Non-alkyl tin-oxo clusters as new-type patterning materials for nanolithography)[J].中国科学:化学（英文版）,2022(01):114-119
A类：
Nanolithography,methylpyrazole,Sn14,oXo,nuclearity,roughnesses,Sn1o
B类：
Non,alkyl,oxo,clusters,new,type,patterning,materials,nanolithography,plays,crucial,roles,miniaturization,dense,integrated,circuit,which,extremely,depends,innovative,Recently,metal,containing,resists,have,been,explored,due,their,higher,short,wavelength,photon,absorption,than,traditional,polymer,Herein,first,performance,has,evaluated,Meanwhile,influence,structural,characteristics,resolution,sensitivity,investigated,To,surface,ligand,three,Sn10,same,were,functionalized,respectively,Furthermore,another,similar,configuration,was,also,prepared,using,study,Spin,coating,then,applied,fabricate,thin,films,these,Si,substrate,showed,various,thicknesses,More,interestingly,electron,beam,EBL,studies,indicated,that,decorated,best,different,cores,patterns,better,those,Finally,distinguishable,achieved,by,expose,energy,significantly,improved,creasing,confirmed,atomic,force,microscopy,AFM,images,This,work,only,opens,applications,but,provides,effective,methodology,improving,future
AB值：
0.472031
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