典型文献
Spatial modulation of nanopattern dimensions by combining interference lithography and grayscale-patterned secondary exposure
文献摘要：
Functional nanostructures are exploited for a variety of cutting-edge fields including plasmonics,metasurfaces,and biosensors,just to name a few.Some applications require nanostructures with uniform feature sizes while others rely on spatially varying morphologies.However,fine manipulation of the feature size over a large area remains a substantial challenge because mainstream approaches to precise nanopatterning are based on low-throughput pixel-by-pixel processing,such as those utilizing focused beams of photons,electrons,or ions.In this work,we provide a solution toward wafer-scale,arbitrary modulation of feature size distribution by introducing a lithographic portfolio combining interference lithography(IL)and grayscale-patterned secondary exposure(SE).Employed after the high-throughput IL,a SE with patterned intensity distribution spatially modulates the dimensions of photoresist nanostructures.Based on this approach,we successfully fabricated 4-inch wafer-scale nanogratings with uniform linewidths of＜5％variation,using grayscale-patterned SE to compensate for the linewidth difference caused by the Gaussian distribution of the laser beams in the IL.Besides,we also demonstrated a wafer-scale structural color painting by spatially modulating the filling ratio to achieve gradient grayscale color using SE.
文献关键词：
中图分类号：
作者姓名：
Zhuofei Gan;Hongtao Feng;Liyang Chen;Siyi Min;Chuwei Liang;Menghong Xu;Zijie Jiang;Zhao Sun;Chuying Sun;Dehu Cui;Wen-Di Li
作者机构：
Department of Mechanical Engineering,University of Hong Kong,Hong Kong,China;School of Microelectronics,Southern University of Science and Technology,Shenzhen,China
文献出处：
引用格式：
[1]Zhuofei Gan;Hongtao Feng;Liyang Chen;Siyi Min;Chuwei Liang;Menghong Xu;Zijie Jiang;Zhao Sun;Chuying Sun;Dehu Cui;Wen-Di Li-.Spatial modulation of nanopattern dimensions by combining interference lithography and grayscale-patterned secondary exposure)[J].光：科学与应用（英文版）,2022(05):832-841
A类：
nanopattern,lithographic,Employed,photoresist,nanogratings
B类：
Spatial,modulation,dimensions,by,combining,interference,lithography,grayscale,patterned,secondary,exposure,Functional,nanostructures,exploited,variety,cutting,edge,fields,including,plasmonics,metasurfaces,biosensors,just,name,few,Some,applications,require,uniform,feature,sizes,while,others,rely,spatially,varying,morphologies,However,fine,manipulation,over,large,area,remains,substantial,challenge,because,mainstream,approaches,precise,nanopatterning,low,throughput,pixel,processing,such,those,utilizing,focused,beams,photons,electrons,In,this,work,provide,solution,toward,wafer,arbitrary,distribution,introducing,portfolio,SE,after,high,intensity,modulates,Based,successfully,fabricated,inch,linewidths,variation,using,compensate,difference,caused,Gaussian,laser,Besides,also,demonstrated,structural,color,painting,modulating,filling,ratio,achieve,gradient
AB值：
0.571485
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