典型文献
Resist nanokirigami for multipurpose patterning
文献摘要：
Resist-based patterning solutions play essential roles in modern micro-and nanoscale science and technology.The commonly used'resist'patterning strategy depends on selective-area scission or cross-linking of resist molecules under the action of an energy beam.In this work,we propose and demonstrate a different resist-patterning strategy,termed'resist nanokirigami',in which the resist structures are defined by their outlines and revealed by selective mechanical peeling of the unwanted resist film.Unlike conventional resist-based patterning processes,the final resist-nanokirigami structures do not undergo exposure and the exposure area is dramatically reduced.With these two advantages,a variety of functional structures that are difficult or impossible to fabricate by conventional processes,such as inverse nanostructures and their oligomers,multi-scale electrodes and freestanding plasmonic nanogaps,can be easily achieved with much higher efficiency.Thus,with its unique and complementary capabilities,the resist-nanokirigami process provides a new patterning solution that expands the family of lithography techniques and will play a significant role in fabricating multi-scale functional structures.
文献关键词：
中图分类号：
作者姓名：
Qing Liu;Yiqin Chen;Zhanyong Feng;Zhiwen Shu;Huigao Duan
作者机构：
National Engineering Research Center for High Efficiency Grinding,State Key Laboratory of Advanced Design and Manufacturing for Vehicle Body,College of Mechanical and Vehicle Engineering Hunan University,Changsha 410082,China
文献出处：
引用格式：
[1]Qing Liu;Yiqin Chen;Zhanyong Feng;Zhiwen Shu;Huigao Duan-.Resist nanokirigami for multipurpose patterning)[J].国家科学评论（英文版）,2022(11):63-73
A类：
nanokirigami,nanogaps
B类：
Resist,multipurpose,patterning,solutions,play,essential,roles,modern,micro,nanoscale,science,technology,commonly,used,resist,strategy,depends,selective,area,scission,cross,linking,molecules,action,energy,beam,In,this,work,we,propose,demonstrate,different,termed,which,defined,by,their,outlines,revealed,mechanical,peeling,unwanted,film,Unlike,conventional,processes,final,do,not,undergo,exposure,dramatically,reduced,With,these,two,advantages,variety,functional,that,difficult,impossible,fabricate,such,inverse,nanostructures,oligomers,electrodes,freestanding,plasmonic,easily,achieved,much,higher,efficiency,Thus,its,unique,complementary,capabilities,provides,new,expands,family,lithography,techniques,will,significant,fabricating
AB值：
0.567812
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