Light trapping photonic crystal (PhC) patterns on the surface of Si solar cells provides a novel opportunity to approach the theoretical efficiency limit of 32.3％, for light-to-electrical power conversion with a single junction cell. This is beyond the efficiency limit implied by the Lambertian limit of ray trapping ～ 29％. The interference and slow light effects are har-nessed for collecting light even at the long wavelengths near the Si band-gap. We compare two different methods for sur-face patterning, that can be extended to large area surface patterning: 1) laser direct write and 2) step-&-repeat 5× reduc-tion projection lithography. Large area throughput limitations of these methods are compared with the established elec-tron beam lithography (EBL) route, which is conventionally utilised but much slower than the presented methods. Spec-tral characterisation of the PhC light trapping is compared for samples fabricated by different methods. Reflectance of Si etched via laser patterned mask was ～ 7％ at visible wavelengths and was comparable with Si patterned via EBL made mask. The later pattern showed a stronger absorbance than the Lambertian limit6.

Jovan Maksimovic;Jingwen Hu;Soon Hock Ng;Tomas Katkus;Gediminas Seniutinas;Tatiana Pinedo Rivera;Michael Stuiber;Yoshiaki Nishijima;Sajeev John;Saulius Juodkazis

Optical Sciences Centre and ARC Training Centre in Surface Engineering for Advanced Materials(SEAM),School of Science,Swinburne University of Technology,Hawthorn Vic 3122,Australia;Melbourne Centre for Nanofabrication,ANFF Victoria,151 Wellington Rd.,Clayton Vic 3168 Australia;Department of Electrical and Computer Engineering,Graduate School of Engineering,Yokohama National University,79-5 Tokiwadai,Hodogaya-ku,Yokohama 240-8501,Japan;Institute of Advanced Sciences,Yokohama National University,79-5 Tokiwadai,Hodogaya-ku,Yokohama 240-8501,Japan;Department of Physics,University of Toronto,60 St.George Street,Toronto,ON,M5S 1A7,Canada;World Research Hub Initiative(WRHI),School of Materials and Chemical Technology,Tokyo Institute of Technology,2-12-1,Ookayama,Meguro-ku,Tokyo 152-8550,Japan

光电进展（英文版）

[1]Jovan Maksimovic;Jingwen Hu;Soon Hock Ng;Tomas Katkus;Gediminas Seniutinas;Tatiana Pinedo Rivera;Michael Stuiber;Yoshiaki Nishijima;Sajeev John;Saulius Juodkazis-.Beyond Lambertian light trapping for large-area silicon solar cells: fabrication methods)[J].光电进展（英文版）,2022(09):14-25

limit6

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