典型文献
Defect engineering of water-dispersible g-C3N4 photocatalysts by chemical oxidative etching of bulk g-C3N4 prepared in different calcination atmospheres
文献摘要：
In this study,water-dispersible graphitic carbon nitride(g-C3N4)photocatalysts were successively pre-pared through the chemically oxidative etching of bulk g-C3N4 that was polymerized thermally in dif-ferent calcination atmospheres such as air,CO2,and N2.The different calcination atmospheres directly influenced the physicochemical and optical properties of both bulk and water-dispersible g-C3N4,chang-ing the photocatalytic degradation behavior of methylene blue(MB)and tetracycline hydrochloride(TC-HCl)for water-dispersible g-C3N4.The bubble-burst process in the thermal polymerization of thiourea produced defective edges containing C=O groups that preferred substituting the C-NHx groups over bulk g-C3N4.In the oxygen-free N2 atmosphere among the different calcination atmospheres,more C=O func-tional groups were generated on the defective edges of bulk g-C3N4,resulting in the highest N vacancy of the tri-s-triazine structure.During the successive chemical oxidation,S-or O-containing functional groups were introduced onto water-dispersible g-C3N4.The water-dispersible g-C3N4 photocatalyst from the oxygen-free N2 atmosphere(NTw)contained the most O-and S-functional groups on the g-C3N4 sur-face.Consequently,NTw exhibited the highest photocatalytic activity in the MB and TC-HCl photodegra-dation because of its slowest recombination process,which was ascribed to the unique surface properties of NTw such as abundant functional groups on the defective edges and N-deficient property.
文献关键词：
中图分类号：
作者姓名：
Thi Kim Anh Nguyen;Thanh-Truc Pham;Bolormaa Gendensuren;Eun-Suok Oh;Eun Woo Shin
作者机构：
School of Chemical Engineering,University of Ulsan,Daehakro 93,Ulsan 44610,South Korea;Department of Material Technology,Faculty of Applied Science,Ho Chi Minh City University of Technology and Education(HCMUTE),No.1 Vo Van Ngan Street,Linh Chieu Ward,Thu Duc District,Ho Chi Minh City 700000,Viet Nam
文献出处：
引用格式：
[1]Thi Kim Anh Nguyen;Thanh-Truc Pham;Bolormaa Gendensuren;Eun-Suok Oh;Eun Woo Shin-.Defect engineering of water-dispersible g-C3N4 photocatalysts by chemical oxidative etching of bulk g-C3N4 prepared in different calcination atmospheres)[J].材料科学技术（英文版）,2022(08):232-243
A类：
NTw,photodegra
B类：
Defect,engineering,water,dispersible,C3N4,photocatalysts,by,oxidative,etching,bulk,prepared,different,calcination,atmospheres,In,this,study,graphitic,carbon,nitride,were,successively,through,chemically,that,was,polymerized,thermally,such,air,N2,directly,influenced,physicochemical,optical,properties,both,chang,photocatalytic,degradation,behavior,methylene,blue,MB,tetracycline,hydrochloride,HCl,bubble,burst,process,polymerization,thiourea,produced,defective,edges,containing,groups,preferred,substituting,NHx,over,oxygen,free,among,more,generated,resulting,highest,vacancy,triazine,structure,During,oxidation,functional,introduced,onto,from,contained,most,Consequently,exhibited,activity,because,its,slowest,recombination,which,ascribed,unique,surface,abundant,deficient,property
AB值：
0.452427
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